Cowper-Symonds material deformation law application in material cutting process using LS-DYNA FE code: turning and milling
Finite element modeling becomes the huge support in understanding technological process. Besides, there are no so much milling process studies, or these studies are simplified to, as orthogonal cutting process. This paper presents experiences results from orthogonal turning and face milling process. These results were taken for FE model validation and material deformation law constants prediction. In both cases some cutting process simplifications were taken, in order to define contact interaction - to execute meso-scale FE analysis. Concerning FE modeling, calculation scheme is presented in order to evaluate removing material load to cutting tool. Secondly, material behaviour characteristics were evaluated, assuming high speed deformation and material failure. Thirdly, cutting tool path is modeled in order to evaluate his influence on chip formation.
https://www.dynamore.de/de/download/papers/konferenz11/papers/session11-paper4.pdf/view
https://www.dynamore.de/@@site-logo/DYNAmore_Logo_Ansys.svg
Cowper-Symonds material deformation law application in material cutting process using LS-DYNA FE code: turning and milling
Finite element modeling becomes the huge support in understanding technological process. Besides, there are no so much milling process studies, or these studies are simplified to, as orthogonal cutting process. This paper presents experiences results from orthogonal turning and face milling process. These results were taken for FE model validation and material deformation law constants prediction. In both cases some cutting process simplifications were taken, in order to define contact interaction - to execute meso-scale FE analysis. Concerning FE modeling, calculation scheme is presented in order to evaluate removing material load to cutting tool. Secondly, material behaviour characteristics were evaluated, assuming high speed deformation and material failure. Thirdly, cutting tool path is modeled in order to evaluate his influence on chip formation.